| Title |
High laser induced damage threshold photoresists for nano-imprint and 3D multi-photon lithography / |
| Authors |
Kabouraki, Elmina ; Melissinaki, Vasileia ; Yadav, Amit ; Melninkaitis, Andrius ; Tourlouki, Konstantina ; Tachtsidis, Theodoros ; Kehagias, Nikolaos ; Barmparis, Georgios D ; Papazoglou, Dimitris G ; Rafailov, Edik ; Farsari, Maria |
| DOI |
10.1515/nanoph-2021-0263 |
| Full Text |
|
| Is Part of |
Nanophotonics.. Berlin : Walter de Gruyter GmbH. 2021, vol. 10, no. 14, p. 3759-3768.. ISSN 2192-8606. eISSN 2192-8614 |
| Keywords [eng] |
3D printing ; additive manufacturing ; diffractive optical elements ; laser damage ; micro-optical elements ; nano-imprint lithography |
| Abstract [eng] |
Optics manufacturing technology is predicted to play a major role in the future production of integrated photonic circuits. One of the major drawbacks in the realization of photonic circuits is the damage of opticalmaterials by intense laser pulses. Here, we report on the preparation of a series of organic–inorganic hybrid photoresists that exhibit enhanced laser-induced damage threshold. These photoresists showed to be candidates for the fabrication ofmicro-optical elements (MOEs) using three-dimensional multiphoton lithography. Moreover, they demonstrate pattern ability by nanoimprint lithography, making them suitable for future mass production of MOEs. |
| Published |
Berlin : Walter de Gruyter GmbH |
| Type |
Journal article |
| Language |
English |
| Publication date |
2021 |
| CC license |
|
