| Title |
Laser-patterned alumina mask and mask-less dry etch of Si for light trapping with photonic crystal structures |
| Authors |
Maksimovic, Jovan ; Mu, Haoran ; Smith, Daniel ; Katkus, Tomas ; Vaičiulis, Mantas ; Aleksiejūnas, Ramūnas ; Seniutinas, Gediminas ; Ng, Soon Hock ; Juodkazis, Saulius |
| DOI |
10.3390/mi14030550 |
| Full Text |
|
| Is Part of |
Micromachines.. Basel : MDPI. 2023, vol. 14, iss. 3, art. no. 550, p. [1-14].. eISSN 2072-666X |
| Keywords [eng] |
ablation ; dry etch ; Lambertian limit ; light trapping ; Si solar cells |
| Abstract [eng] |
Ultra-short 230 fs laser pulses of a 515 nm wavelength were tightly focused onto 700 nm focal spots and utilised in opening ∼0.4–1 μm holes in alumina Al2O3 etch masks with a 20–50 nm thickness. Such dielectric masks simplify the fabrication of photonic crystal (PhC) light-trapping patterns for the above-Lambertian performance of high-efficiency solar cells. The conditions of the laser ablation of transparent etch masks and the effects sub-surface Si modifications were revealed by plasma etching, numerical modelling, and minority carrier lifetime measurements. Mask-less patterning of Si is proposed using fs laser direct writing for dry plasma etching of Si. |
| Published |
Basel : MDPI |
| Type |
Journal article |
| Language |
English |
| Publication date |
2023 |
| CC license |
|
