| Abstract [eng] |
The formation of optical coatings on structured elements using atomic layer deposition technology Hybrid polymer SZ2080 is used for the fabrication of micro-optical components by two photon polymerization technique. Physical vapor deposition is restricted in capabilities to deposit conformal coatings on 3D components. ALD is a promising thin film deposition technique because of strict control of the growth rate and the opportunity to fabricate coating on complex structure substrates. The optimization of the process is necessary before the deposition. The crystallization of titanium oxide layers was investigated: it was found that after thermal deposition of titanium oxide at 150 °C, the thin film is already polycrystalline. The crystallization of the titanium oxide was inhibited with the nanolaminate structure. However, the optical losses of the nanolaminate in visible spectral region are still high. TiO2 film synthesized using water exposure has lower optical losses in visible spectral range. The influence of synthesis parameters on refractive index was determined. The highest refractive index of TiO2 was achieved using plasma enhanced atomic layer deposition process. Aluminum oxide and titanium oxide singlelayer coatings were synthesized at 60 ⁰C. The refractive indices and optical losses of the manufactured Al2O3 and TiO2 films were evaluated from the transmittance spectra of thin single layers and used for the design of the anti-reflective (AR) optical coating. Also, singlelayer coatings were deposited on microstructures. The focal length of the microlenses reduces from 6 % to 10 % after Al2O3 deposition and increases from 0,5 % to 10 % after TiO2 deposition. In both cases, after deposition the surface roughness of the microstructures is reduced. In the design of AR coating with R < 0,1 % for the wavelength of 633 nm, TiO2 was used as high refractive index material while Al2O3 was used as low refractive index material. Modeled design was fabricated and analyzed. The reflection of 0,1 % at the wavelength of 633 nm was reached. The geometry of the microlenses did not change after deposition of the anti-reflective coating. After deposition surface roughness of the microstructures is reduced. The aim of this paper is to fabricate the antireflective coating, using atomic layer deposition technique, on the microstructures made of hybrid polymer SZ2080. |
