| Abstract [eng] |
Formation and characterization of high-reflective coatings from nanostructure SiO2 Danutė Bakaitytė Summary In this work the influence of evaporation characteristics on the formation of sculptured silicon dioxide (SiO2) layers have been investigated. Scope of this work includes sculptured monolayers and multilayer thin films with sculptured interlayers. To optimize the process the following parameters were varied during formation of sculptured SiO2 monolayers: evaporation rate, rotational frequency and angle of rotating samples. After that series of multilayers thin films consisting of 8, 30 and 50 layers were produced with sculptured layer sat ∠=70º and ∠=80º inclination. To characterize the obtained multilayer films roughness, the numbers of defects and spectral sensitivity to water were measured. Lastly we compared the laser-induced damage threshold of thin films with sculptured layers versus standard thin films. Obtained results indicate that certain combinations of parameters result in sculptured SiO2 multilayers with damage threshold increased by a factor of 4 to 7. |
