| Abstract [eng] |
Scientists face challenges every day while conducting experiments in scientific laboratories. Often there is a lack of special equipment that could enable us to face these challenges. Optical coatings are one of the most commonly discussed topics for the development of new generation optical elements. The most commonly discussed topics in the development of optical elements from dielectric materials point of view. However ultrathin metallic layers have properties that can significantly improve the properties of an optical element. In this study ultrathin metallic layers formation, the dependence of their substrate temperature, deposition rate and the thickness of the layer will be examined. The reasons for the loss of localized surface plasmons and the reduction of these effects will be presented in this work, together with the methodology for the formation of non-polarizing coatings. Interpolation, holographic and other experiments often use non-polarizing beam splitters, allowing splitting the laser light into two parts without changing polarization. This optical element is very valuable, but its production is very complicated, and even the slightest error can damage the entire element. Optimal conditions for the formation of ultrathin metal layers were determined by methods of characterizing the surface structure and optical properties through evaporation of the physical layers. It has been found that the deposition rate has a great influence on the formation of the samples, as well as the temperature. In the case of low speeds and high temperatures, the continuous layer does not form and resonance from the separated metal islands add to the absorption of the material. Suitable forming parameters allow the formation of ultrathin continuous layers of metal that are used together with dielectric coatings to form non polarizing coatings. |
