| Title |
Stitch-less lithography empowered by multi-dimensional holography |
| Authors |
Huang, Hsin-Hui ; Mu, Haoran ; Puig Vilardell, Eulalia ; Anand, Vijayakumar ; Gailevičius, Darius ; Juodkazis, Saulius |
| DOI |
10.3390/nano16110692 |
| Full Text |
|
| Is Part of |
Nanomaterials.. Basel : MDPI. 2026, vol. 16, iss. 11, art. no. 692, p. [1-18].. eISSN 2079-4991 |
| Keywords [eng] |
3D ; diffraction limit ; feature size ; microfabrication ; resolution ; stitching-less lithography ; threshold effect |
| Abstract [eng] |
Trends in Micro- and Nano-Lithography required for future development of large area applications ranging from high-packing-density electronics to solar cells are surveyed and outlined. Strategies to use direct laser writing to define etch masks over large areas by: (i) fixed beam moving stage and (ii) moving beam moving stage approaches are presented. The extension of planar 2D and stacked 2D (or 2.5D) fabrication methods into 3D micro- and nano-fabrication is discussed. One of the essential future characteristics of 3D nanolithography is real-time feedback capability. This can be realised via inherent 3D-capable holography, which bridges lithographic exposure control, wavefront sensing, and adaptive feedback, providing a pathway to stitch-free, large-area 3D patterning. The future of micro-fabrication is expected to evolve via highly specialised 3D architecture design and reduction in post-processing steps. |
| Published |
Basel : MDPI |
| Type |
Journal article |
| Language |
English |
| Publication date |
2026 |
| CC license |
|
