| Abstract [eng] |
The ALD method was applied to the formation of anti-reflective coatings on solar cells improving their efficiency. The application of the ALD method as a step in the formation of plasmonic structures enabled control over the wavelength of the Tamm plasmon polariton resonance with a nanometre accuracy. Furthermore, atomic layer deposited dielectric interlayer between a metal nanobump lattice and organic dye allowed the intensity of coherent radiation to be controlled. The results obtained in this thesis open up possibilities for practical applications in fields of photovoltaics and nanophotonics. The research carried out fully substantiates the versatility of the ALD method and its broad technological applicability, which is determined by the cyclic mechanism of monomolecular surface reactions. Due to its ability to form nanocoatings with sub-nanometre precision on objects with varying topography, this method enables the precise modification of nano- and microstructural features for various purposes. The flexibility of the methodology lies in the ability, during the ALD cycle, to selectively choose and combine the number of process cycles with different dielectric materials, such as aluminium oxide, titanium oxide, hafnium oxide and silicon oxide, thereby tailoring the optical, electrical and chemical properties of the final coating to specific engineering requirements. |
