| Abstract [eng] |
The purpose that directs the broad field of lithographic fabrication is to provide reliable methods for producing structures with maximally strictly defined geometries. In general terms, the dimensions of functional component features or their arrangements dictate which physical phenomena they will be capable of affecting or interfacing with, as well as the duration of various transport processes. For a considerable range of photonic phenomena structures have to be made on the scale of a single optical wavelength or below, hence, among all of the available approaches only a select few fabrication methods possess the requisite resolution to exert fine control over relevant optics-related interactions. This work is centered on leveraging nanoscale high-precision fabrication methods, mainly electron and ion beam lithography as well as physical vapor deposition or reactive ion etching auxiliary pattern transfer techniques, to produce various structures and components exhibiting a range of functionalities relating to radiation interaction with mater - including integrated photonic waveguide resonators for optical bio-sensing, micro-optical elements for shaping custom polarization or topological charge wavefronts, and plasmonic metasurfaces for spectrally selective absorbance enhancement. In addition, miniaturization here is leveraged to provide novel capabilities for thermometric detection, molecular sensing and even in the quantum science of ultracold atom trapping. |
