| Abstract [eng] |
Objective of the thesis was to extend the applicability of ion beam sputtered optical coatings for UV spectral range laser applications by optimizing plasma treatment of optical substrates, sputtering of material mixtures and post-deposition treatment of deposited coatings. Dissertation consists of introduction, literature overview, experimental methods, results and conclusions, list of references, summary and copies of author’s publications. Development of argon and oxygen plasma etching of fused silica substrates is presented, enabling realization of transparent optical components for high power UV lasers. Also, combined approach using HfO2-SiO2 mixtures and high temperature thermal annealing was demonstrated, enabling considerable increase of laser induced damage threshold and optical properties improvement of dielectric mirrors for 266 nm wavelength. Binary mixtures of common metal oxides - HfO2, Sc2O3 and Al2O3 were shown to be perspective candidates for development of stress compensated multilayer coatings for UV spectral range without degradation of optical, microstructural properties, if applying appropriate annealing temperature. |
