| Abstract [eng] |
The rapid development of femtosecond (fs) laser-based material processing led to the emergence of numerous new research areas. 3D laser lithography (3DLL) is an additive manufacturing technique based on fs radiation, allowing to utilize a huge array of materials and achieve free-form 3D structures. Current development of this technology is associated with the throughput increase and enhanced applicability of created elements. Both topics are addressed in the dissertation. First, synchronized motion of galvo-scanners and linear stages was employed to produce 3D meso-scale structures. Capabilities of such approach were explored as well as the possible limitations were explained. Possibility to expand this methodology using different focusing conditions were shown. The structuring rate can be tuned in two orders of magnitude from ∼1800 μm3/s to ∼31300 μm3/s. Photopolymerization without using a photoinitiator was explored next. The research showed that the structures produced this way show no negative impact on their quality. Furthermore, photoinitiator-free fabrication allows to achieve higher resolution and grants surface roughness bellow 10 nm RMS. Finally, the question of 3DLL made structure laser induced damage threshold (LIDT) was investigated both qualitatively and quantitatively. Discovered general tendencies were that LIDT depends on material absorption, composition, and geometry. Overall, non-photosensitized SZ2080 showed the highest LDIT of 161.9 TW/cm2. |
